PRASAD, Vinay; APPADURAI, Arun. Simulation and Analysis of PECVD Process for Silicon Nitride Deposition Using CFD: Impact of Pressure on Deposition Uniformity. SiliconPV Conference Proceedings, [S. l.], v. 3, 2026. DOI: 10.52825/siliconpv.v3i.2695. Disponível em: https://www.tib-op.org/ojs/index.php/siliconpv/article/view/2695. Acesso em: 13 mar. 2026.