Reducing Time and Costs of FT-IR Studies of the Effect of SiNx, Dopants, and Emitter on Hydrogen Species in Si Wafers and Solar Cell Structures

Authors

DOI:

https://doi.org/10.52825/siliconpv.v1i.840

Keywords:

FT-IR Spectroscopy, Hydrogen Detection, Photovoltaics, Silicon

Abstract

Accurately measuring the hydrogen content in silicon (Si) solar cells is essential due to its connection to surface degradation and light and elevated temperature induced degradation (LeTID). Fourier Transform-Infrared (FT-IR) spectroscopy provides a quantitative technique for determining the content of various hydrogen species in Si wafers that have undergone various process steps. In this study, we examine both the effect of a silicon nitride (SiNx:H) layer during FT-IR spectroscopic measurements on hydrogen species, as well as the impact of an emitter present during firing on the amount of hydrogen introduced into Si wafers. We find that the presence of SiNx:H during measurements has negligible effects on the measured hydrogen species, potentially simplifying the preparation steps for FT-IR. For the emitter investigation we analyze boron (B)- and gallium (Ga)-doped p-type wafers to detect H-B, H-Ga, Oi-H2, and H2. We observe that hydrogen species initially present in B- and Ga-doped Si wafers differ significantly. Only H-Ga is detected in Ga-doped wafers, while H-B, Oi-H2, and H2 signals are measured in B-doped wafers. Moreover, we cannot confirm an increased release of H through the emitter into the bulk during the firing process. Finally, we conduct measurements at different temperatures and confirm that cryogenic temperatures are more effective for detecting H-B and H2 with concentrations in the 1014 cm-3 range. Nevertheless, useful spectra can still be obtained at liquid nitrogen (N2) temperatures.

Downloads

Download data is not yet available.

References

F. Chen, et al., Relationship between PECVD silicon nitride film composition and surface and edge passivation, European Photovoltaic Solar Energy Conference 2007, Sep 3-7, 2007, Milan, Italy.

B. Hallam, B. Tjahjono, and S. R. Wenham, “Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers,” Sol. Energy Mater Sol. Cells, vol. 96, pp. 173-179, Jan 2012, doi: https://doi.org/10.1016/J.SOLMAT.2011.09.052.

S. Wilking, A. Herguth, and G. Hahn, “Influence of hydrogenated passivation layers on the regeneration of boron-oxygen related defects,” Energy Procedia, vol. 38, pp. 642-648, 2013, doi: https://doi.org/10.1016/j.egypro.2013.07.328.

T. Niewelt et al., „Understanding the light-induced degradation at elevated temperatures: Similarities between multicrystalline and floatzone p-type silicon,” Prog. Photovolt., vol. 26, no. 8, pp. 533-542, 2018, doi: https://doi.org/10.1002/pip.2954.

R. Sharma et al., Hydrogen diffusion from PECVD silicon nitride into multicrystalline silicon wafers: Elastic recoil detection analysis (ERDA) measurements and impact on light and elevated temperature induced degradation (LeTID), SiliconPV 2019, April 8-10, 2019, Leuven, Belgium, doi: https://doi.org/10.1063/1.5123896.

D. Chen et al., “Progress in the understanding of light- and elevated temperature-induced degradation in silicon solar cells: A review,” Prog. Photovolt., vol. 29, no. 11, pp. 1180-1201, 2021, doi: https://doi.org/10.1002/pip.3362.

K. Ramspeck et al., Light Induced Degradation of Rear Passivated mc-Si Solar Cells, 27th EUPVSEC WIP, Sep 24-28, 2012, Frankfurt, Germany, doi: https://doi.org/10.4229/27thEUPVSEC2012-2DO.3.4

D. Chen et al., “Hydrogen induced degradation: A possible mechanism for light- and elevated temperature- induced degradation in n-type silicon,” Sol. Energy Mater Sol. Cells, vol. 185, pp. 174-182, 2018, https://doi.org/10.1016/j.solmat.2018.05.034.

C. Fischer et al., “Influence of highly doped layers on hydrogen in-diffusion into crystalline silicon,” Sol. Energy Mater Sol. Cells, vol. 250, pp. 112056, 2023, doi: https://doi.org/10.1016/j.solmat.2022.112056.

F. Wolny et al., Wafer FT-IR – measuring interstitial oxygen on as cut and processed silicon wafers, SiliconPV 2016, March 07-09, 2016, Chambéry, France, doi: https://doi.org/10.1016/j.egypro.2016.07.076.

P. M. Weiser et al., “Hydrogen-related defects measured by infrared spectroscopy in multicrystalline silicon wafers throughout an illuminated annealing process,” J. Appl. Phys., vol. 127, no. 6, pp. 65703, 2020, doi: https://doi.org/10.1063/1.5142476.

R. Søndenå, P. M. Weiser, and E. Monakhov, Direct and indirect determination of hydrogen-boron complexes in float-zone silicon wafers, SiliconPV 2021, April 19-23, 2021, Hamelin, Germany, doi: https://doi.org/10.1063/5.0089274.

B. Hammann et al., “The Impact of Different Hydrogen Configurations on Light- and Elevated-Temperature- Induced Degradation,” IEEE J. Photovolt., vol. 13, no. 2, pp. 224-235, 2023, doi: https://doi.org/10.1109/JPHOTOV.2023.3236185.

I. Jonak-Auer, R. Meisels, and F. Kuchar, „Determination of the hydrogen concentration of silicon nitride layers by Fourier transform infrared spectroscopy,” Infrared Phys Technol, vol. 38, no. 4, pp. 223-226, 1997, doi: https://doi.org/10.1016/S1350-4495(97)00011-X.

J. Simon, A. Herguth, and G. Hahn, “Quantitative analysis of boron–hydrogen pair dynamics by infrared absorption measurements at room temperature,” J. Appl. Phys., vol. 131, no. 23, pp. 135703, 2022, doi: https://doi.org/10.1063/5.0090965.

S. A. McQuaid et al., “Concentration of atomic hydrogen diffused into silicon in the temperature range 900–1300 °C,” Appl. Phys Lett., vol. 58, no. 25, pp. 2933-2935, 1991, doi: https://doi.org/10.1063/1.104726.

M. Stavola et al., “Vibrational characteristics of acceptor‐hydrogen complexes in silicon,” Appl. Phys Lett., vol. 50, no. 16, pp. 1086-1088, 1987, doi: https://doi.org/10.1063/1.97978.

R. E. Pritchard et al., “Interactions of hydrogen molecules with bond-centered interstitial oxygen and another defect center in silicon,” Phys. Rev. B, vol 56, no. 20, pp. 13778-13125, Nov 1997, doi: https://doi.org/10.1103/PhysRevB.56.13118.

R. E. Pritchard et al., “Hydrogen molecules in boron-doped crystalline silicon,” Semicond. Sci. Technol., vol 14, no. 1, pp. 77, Jan 1999, doi: https://doi.org/10.1088/0268-1242/14/1/011.

Y. Acker, J. Simon, and A. Herguth, “Formation Dynamics of BH and GaH-Pairs in Crystalline Silicon During Dark Annealing,” Phys. Status Solidi A, vol. 219, no. 17, pp. 2200142, 2022, doi: https://doi.org/10.1002/pssa.202200142.

Downloads

Published

2024-02-22

How to Cite

Aßmann, N., Søndenå, R., Hammann, B., Kwapil, W., & Monakhov, E. (2024). Reducing Time and Costs of FT-IR Studies of the Effect of SiNx, Dopants, and Emitter on Hydrogen Species in Si Wafers and Solar Cell Structures. SiliconPV Conference Proceedings, 1. https://doi.org/10.52825/siliconpv.v1i.840

Conference Proceedings Volume

Section

Silicon Material and Defect Engineering

Funding data